Invention Grant
- Patent Title: Cleaning solution and manufacturing method therefor
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Application No.: US14915211Application Date: 2013-08-30
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Publication No.: US10194665B2Publication Date: 2019-02-05
- Inventor: Yasuo Shichitani
- Applicant: Epios Co., LTD
- Applicant Address: JP
- Assignee: EPIOS CO., LTD.
- Current Assignee: EPIOS CO., LTD.
- Current Assignee Address: JP
- Agency: Fishman Stewart PLLC
- International Application: PCT/JP2013/074600 WO 20130830
- International Announcement: WO2015/029263 WO 20150305
- Main IPC: C25B1/26
- IPC: C25B1/26 ; A61K33/20 ; A61K33/14 ; A01N59/00 ; A01N59/08 ; C02F1/467 ; A61Q17/00 ; A61Q19/10 ; A61K8/20 ; A61Q11/00 ; C11D7/08 ; C11D7/10

Abstract:
The present invention has an object to provide a highly stable cleaning solution that generates a high concentration of hypochlorous acid during cleaning, and has sterilizing and washing out activity on bacteria and viruses. As means for achieving this object, a cleaning solution has been developed which is an aqueous solution containing hypochlorous acid and hypochlorite ions produced using a diaphragm-free electrolysis process. The effective residual chlorine concentration thereof and the hydrogen ion concentration exponent thereof are adjusted to a value from 500 ppm to 2000 ppm and to a value from pH 8.5 to pH 9.5, respectively. Thus, the cleaning solution remains stable for a prolonged period of time, and exhibits high sterilizing and wash-out activity during use.
Public/Granted literature
- US20160205937A1 CLEANING SOLUTION AND MANUFACTURING METHOD THEREFOR Public/Granted day:2016-07-21
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