Invention Grant
- Patent Title: Element substrate and method for manufacturing the same
-
Application No.: US15687240Application Date: 2017-08-25
-
Publication No.: US10195850B2Publication Date: 2019-02-05
- Inventor: Shintaro Kasai , Akiko Saito
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2016-168005 20160830
- Main IPC: B41J2/14
- IPC: B41J2/14 ; B41J2/16

Abstract:
An element substrate includes a substrate including a supply port configured to supply liquid, and a discharge port forming member including a discharge port configured to discharge the liquid supplied from the supply port. The discharge port forming member includes a liquid flow path communicating between the discharge port and the supply port on a surface opposed to a surface where the discharge port is provided. The discharge port forming member includes thick film portions and thin film portions in a region where the liquid flow path is formed. The thick film portions are lined up in a first direction so as to sandwich the discharge port therebetween and thicker than an adjacent portion adjacent to the discharge port. The thin film portions are lined up in a second direction intersecting with the first direction so as to sandwich the discharge port therebetween and thinner than the adjacent portion.
Public/Granted literature
- US20180056653A1 ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2018-03-01
Information query
IPC分类: