Invention Grant
- Patent Title: Nitrogen containing polymers as levelers
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Application No.: US15021075Application Date: 2013-11-06
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Publication No.: US10196751B2Publication Date: 2019-02-05
- Inventor: Lingli Duan , Zuhra I. Niazimbetova , Chen Chen , Tong Sun , Maria Rzeznik
- Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC , DOW GLOBAL TECHNOLOGIES LLC
- Applicant Address: US MA Marlborough US MI Midland
- Assignee: Rohm and Haas Electronic Materials LLC,Dow Global Technologies LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC,Dow Global Technologies LLC
- Current Assignee Address: US MA Marlborough US MI Midland
- Agent John J. Piskorski
- International Application: PCT/CN2013/086585 WO 20131106
- International Announcement: WO2015/066848 WO 20150514
- Main IPC: C25D3/38
- IPC: C25D3/38 ; C25D3/32 ; C09D179/04 ; C08G73/06 ; C25D3/58 ; C25D3/60 ; H05K3/10 ; C25D7/00 ; H05K3/18 ; C25D7/12
Abstract:
Polymers of reaction products of polyamines and nitrogen containing cyclic compounds are included in metal electroplating compositions to provide level metal deposits on substrates.
Public/Granted literature
- US20160237579A1 NITROGEN CONTAINING POLYMERS AS LEVELERS Public/Granted day:2016-08-18
Information query
