Invention Grant
- Patent Title: Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields
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Application No.: US15305166Application Date: 2016-08-18
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Publication No.: US10197389B2Publication Date: 2019-02-05
- Inventor: Vladimir Levinski , Yuri Paskover , Yuval Lubashevsky , Amnon Manassen
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Hodgson Russ LLP
- International Application: PCT/US2016/047619 WO 20160818
- International Announcement: WO2017/044283 WO 20170316
- Main IPC: G01B11/02
- IPC: G01B11/02 ; G01B11/27 ; G01B9/02 ; G01N21/47 ; G03F7/20

Abstract:
Metrology measurement methods and tools are provided, which illuminate a stationary diffractive target by a stationary illumination source, measure a signal composed of a sum of a zeroth order diffraction signal and a first order diffraction signal, repeat the measuring for a plurality of relations between the zeroth and the first diffraction signals, while maintaining the diffractive target and the illumination source stationary, and derive the first order diffraction signal from the measured sums. Illumination may be coherent and measurements may be in the pupil plane, or illumination may be incoherent and measurements may be in the field plane, in either case, partial overlapping of the zeroth and the first diffraction orders are measured. Illumination may be annular and the diffractive target may be a one cell SCOL target with periodic structures having different pitches to separate the overlap regions.
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