Invention Grant
- Patent Title: Mask and photo alignment method
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Application No.: US15534055Application Date: 2016-05-05
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Publication No.: US10197863B2Publication Date: 2019-02-05
- Inventor: Guojing Ma , Changjian Xu , Dan Wang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Beijing
- Agency: Calfee, Halter & Griswold LLP
- Priority: CN201610171864 20160324
- International Application: PCT/CN2016/081104 WO 20160505
- International Announcement: WO2017/161644 WO 20170928
- Main IPC: G02F1/1337
- IPC: G02F1/1337 ; G01B11/14 ; G02F1/13 ; G03F1/42 ; H05K3/00
Abstract:
A mask including a plurality of baffles, a frame and a light transmission region, and a photo alignment method are provided. A support component and a movable component are disposed on the frame. The baffle is configured to block the light transmission region. The support component is configured to support the baffle which blocks the light transmission region. The movable component is configured to move the baffle to a position blocking the light transmission region.
Public/Granted literature
- US20180107073A1 MASK AND PHOTO ALIGNMENT METHOD Public/Granted day:2018-04-19
Information query
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