Invention Grant
- Patent Title: Light source system employing two light emitting devices and related projection system employing two spatial light modulators
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Application No.: US15599364Application Date: 2017-05-18
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Publication No.: US10197897B2Publication Date: 2019-02-05
- Inventor: Fei Hu , Yi Li , Liangliang Cao , Yi Yang
- Applicant: APPOTRONICS CHINA CORPORATION
- Applicant Address: CN Shenzhen
- Assignee: APPOTRONICS CORPORATION LIMITED
- Current Assignee: APPOTRONICS CORPORATION LIMITED
- Current Assignee Address: CN Shenzhen
- Agency: Chen Yoshimura LLP
- Priority: CN201210370491 20120928
- Main IPC: G03B21/20
- IPC: G03B21/20 ; H04N9/31 ; G03B33/08 ; F21V14/08 ; G02B27/14 ; G03B21/00

Abstract:
A light source system comprises: a light-emitting device for emitting a first light and a second light in sequence; a beam splitting system with which the first light is divided into one beam in a first range of wavelength and the other beam in a second range of wavelength, respectively emitted along a first optical path and a second optical path, and also with which at least a part of the second light is emitted along the first optical path; a first spatial light modulator for modulating the beam emitted from the beam splitting system along the first optical path; a second spatial light modulator for modulating the beam emitted from the beam splitting system along the second optical path. The light source system has the advantages of high light-emitting efficiency and low cost. A projection system comprising the aforementioned light source system is also provided.
Public/Granted literature
- US20170255091A1 LIGHT SOURCE SYSTEM AND RELATED PROJECTION SYSTEM Public/Granted day:2017-09-07
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