The present invention provides an imprint apparatus which forms a pattern of an imprint material on a substrate using a mold, comprising a supply unit including a plurality of orifices and configured to supply the imprint material on the substrate by discharging the imprint material from each orifice, and a control unit configured to control the discharge of the imprint material from each orifice in accordance with arrangement information showing an arrangement of the imprint material on the substrate, wherein the control unit updates the arrangement information to bring a product of an ideal volume of the imprint material discharged from each orifice in one-time discharge and the number of discharges of the imprint material supplied on the substrate from the supply unit closer to a total amount of the imprint material actually supplied on the substrate in accordance with the arrangement information.