Invention Grant
- Patent Title: Methods and systems for improved mask processing
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Application No.: US14499121Application Date: 2014-09-27
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Publication No.: US10199256B2Publication Date: 2019-02-05
- Inventor: Edward Ng , Jeffrey C. Hudgens , Ayan Majumdar , Sushant S. Koshti
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Dugan & Dugan, PC
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01L21/677 ; H01L21/67 ; B65H15/00 ; B65H43/04 ; B08B1/00
Abstract:
In some embodiments, methods and systems are provided for improved handling of lithography masks including loading a mask via a first load port from a first carrier; inverting the mask using a first contact pad; cleaning the mask; inverting the mask using a second contact pad; and unloading the mask via a second load port into a second carrier. Numerous other aspects are provided.
Public/Granted literature
- US20150090294A1 METHODS AND SYSTEMS FOR IMPROVED MASK PROCESSING Public/Granted day:2015-04-02
Information query
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