Invention Grant
- Patent Title: Fixed position mask for workpiece edge treatment
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Application No.: US15605106Application Date: 2017-05-25
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Publication No.: US10199257B2Publication Date: 2019-02-05
- Inventor: Fletcher Ian Potter , Philip Layne , Keith A. Fernlund , Michael Swears , Richard Allen Sprenkle
- Applicant: Varian Semiconductor Equipment Associates, Inc.
- Applicant Address: US MA Gloucester
- Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
- Current Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
- Current Assignee Address: US MA Gloucester
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01L21/68 ; H01L21/67 ; H01L21/02 ; H01L21/48 ; H01L21/265

Abstract:
Embodiments of the disclosure include a fixed position mask for workpiece edge treatment. In some embodiments, an apparatus includes a roplat having a rotatable assembly, and a platen coupled to the rotatable assembly, wherein the platen is configured to hold a workpiece. The apparatus further includes a bracket affixed to the rotatable assembly, and a mask directly coupled to the bracket, wherein the mask is positioned adjacent the workpiece. The mask covers an inner portion of the platen and the workpiece, leaving just an outer circumferential edge of the workpiece exposed to an ion treatment. In some embodiments, the platen is permitted to rotate relative to the bracket during an ion treatment. In some embodiments, the mask includes a solid plate section devoid of any openings, and a mounting portion extending from the plate section, wherein the mounting portion is directly coupled to an extension arm of the bracket.
Public/Granted literature
- US20180342413A1 FIXED POSITION MASK FOR WORKPIECE EDGE TREATMENT Public/Granted day:2018-11-29
Information query
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