Invention Grant
- Patent Title: Multi-directional self-aligned multiple patterning
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Application No.: US15605327Application Date: 2017-05-25
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Publication No.: US10199270B2Publication Date: 2019-02-05
- Inventor: Colin Bombardier , Ming He , Vikrant Chauhan , Anbu Selvam KM Mahalingam , Keith Donegan
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Thompson Hine LLP
- Agent Anthony Canale
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L21/66 ; H01L23/522 ; H01L23/528

Abstract:
Interconnect structures and methods of fabricating an interconnect structure. First and second non-mandrel interconnects are formed in an interlayer dielectric layer. The first non-mandrel interconnect and the second non-mandrel interconnect have respective side surfaces that extend in a first direction. The connector interconnect extends in a second direction transverse to the first direction from the side surface of the first non-mandrel interconnect to the side surface of the second non-mandrel interconnect.
Public/Granted literature
- US20180342421A1 MULTI-DIRECTIONAL SELF-ALIGNED MULTIPLE PATTERNING Public/Granted day:2018-11-29
Information query
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