Semiconductor structures and fabrication methods thereof are provided. An exemplary semiconductor structure includes a semiconductor substrate having a device region and a protective region around the device region; a seal ring structure on the semiconductor substrate in the protective region; an electrical interconnect structure on the semiconductor substrate in the device region; an interlayer dielectric layer entirely covering the protective region on the seal ring structure and the electrical interconnect structure; a solder pad electrically connected with the electrical interconnect structure passing through a portion of the interlayer dielectric layer in the device region; a passivation layer on the interlayer dielectric layer and exposing the solder pad; and a conducive wire connected to the solder pad and across over a portion of the passivation layer in the protective region.