Invention Grant
- Patent Title: Method of manufacturing a semiconductor device comprising a support element and semiconductor device comprising a support element
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Application No.: US15587184Application Date: 2017-05-04
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Publication No.: US10199332B2Publication Date: 2019-02-05
- Inventor: Oliver Hellmund , Peter Irsigler , Sebastian Schmidt , Hans-Joachim Schulze , Martina Seider-Schmidt
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater Matsil, LLP
- Priority: DE102016108500 20160509
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L21/306 ; H01L21/768 ; H01L23/528 ; H01L29/08 ; H01L29/66 ; H01L29/78 ; H01L29/417 ; H01L29/06 ; H01L21/304

Abstract:
A semiconductor device includes a power transistor in a semiconductor substrate portion, where the semiconductor substrate portion includes a central portion and a kerf, components of the power transistor are arranged in the central portion, and the central portion has a thickness d. The semiconductor device also includes a support element disposed over a main surface of the central portion, where the support element has a smallest lateral extension t at a side adjacent to the main surface of the semiconductor substrate portion and a height h, where 0.1×h≤d≤4×h and 0.1×h≤t≤1.5×h.
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Information query
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