Invention Grant
- Patent Title: Manufacturing methods of MOSFET-type compact three-dimensional memory
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Application No.: US15453866Application Date: 2017-03-08
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Publication No.: US10199432B2Publication Date: 2019-02-05
- Inventor: Guobiao Zhang
- Applicant: Guobiao Zhang
- Applicant Address: CN HangZhou, ZheJiang US OR Corvallis
- Assignee: HangZhou HaiCun Information Technology Co., Ltd.,Guobiao Zhang
- Current Assignee: HangZhou HaiCun Information Technology Co., Ltd.,Guobiao Zhang
- Current Assignee Address: CN HangZhou, ZheJiang US OR Corvallis
- Priority: CN201710105767 20170227; CN201710109700 20170228
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L45/00 ; G11C13/00 ; H01L27/06 ; H01L27/10 ; H01L27/102

Abstract:
Manufacturing methods of MOSFET-type compact three-dimensional memory (3D-MC) are disclosed. In a memory level stacked above the substrate, an x-line extends from a memory array to an above-substrate decoding stage. A MOSFET-type transistor is formed on the x-line as a decoding device for the above-substrate decoding stage, where the overlap portion of the x-line with the control-line (c-line) is semi-conductive.
Public/Granted literature
- US20170194379A1 Manufacturing Methods of MOSFET-Type Compact Three-Dimensional Memory Public/Granted day:2017-07-06
Information query
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