Invention Grant
- Patent Title: Methods of forming a gate cap layer above a replacement gate structure
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Application No.: US14928681Application Date: 2015-10-30
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Publication No.: US10199479B2Publication Date: 2019-02-05
- Inventor: Gunter Grasshoff , Catherine Labelle
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Amerson Law Firm, PLLC
- Main IPC: H01L21/28
- IPC: H01L21/28 ; H01L29/66 ; H01L21/768 ; H01L21/3105 ; H01L21/311 ; H01L21/321
Abstract:
A method includes performing a first chemical mechanical polishing process to define a polished replacement gate structure having a dished upper surface, wherein the polished dished upper surface of the polished replacement gate structure has a substantially curved concave configuration. A gate cap layer is formed above the polished replacement gate structure, wherein a bottom surface of the gate cap layer corresponds to the polished dished upper surface of the polished replacement gate structure.
Public/Granted literature
- US20160056263A1 METHODS OF FORMING A GATE CAP LAYER ABOVE A REPLACEMENT GATE STRUCTURE Public/Granted day:2016-02-25
Information query
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