Invention Grant
- Patent Title: Shadow mask alignment and management system
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Application No.: US15076523Application Date: 2016-03-21
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Publication No.: US10199660B2Publication Date: 2019-02-05
- Inventor: Byung-Sung Leo Kwak , Stefan Bangert , Ralf Hofmann , Michael Koenig
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01M6/40
- IPC: H01M6/40 ; H01M4/13 ; H01M4/139 ; H01M4/58 ; H01M4/62 ; H01M4/66 ; C23C14/04 ; H01M4/02

Abstract:
A magnetic handling assembly for thin-film processing of a substrate, a system and method for assembling and disassembling a shadow mask to cover a top of a workpiece for exposure to a processing condition. The assembly may include a magnetic handling carrier and a shadow mask disposed over, and magnetically coupled to, the magnetic handling carrier to cover a top of a workpiece that is to be disposed between the shadow mask and the magnetic handling carrier when exposed to a processing condition. A system includes a first chamber with a first support to hold the shadow mask, a second support to hold a handling carrier, and an alignment system to align the shadow mask a workpiece to be disposed between the carrier and shadow mask. The first and second supports are moveable relative to each other.
Public/Granted literature
- US20160204451A1 SHADOW MASK ALIGNMENT AND MANAGEMENT SYSTEM Public/Granted day:2016-07-14
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