Invention Grant
- Patent Title: Lens design method and radiation source substrate
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Application No.: US15327084Application Date: 2015-03-18
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Publication No.: US10199740B2Publication Date: 2019-02-05
- Inventor: Yang Hao
- Applicant: BAE Systems plc
- Applicant Address: GB London
- Assignee: BAE Systems plc
- Current Assignee: BAE Systems plc
- Current Assignee Address: GB London
- Agency: Maine Cernota & Rardin
- Priority: GB1413125.4 20140724
- International Application: PCT/GB2015/050788 WO 20150318
- International Announcement: WO2016/012745 WO 20160128
- Main IPC: H01Q9/04
- IPC: H01Q9/04 ; H01Q15/10 ; H01Q19/06 ; H01Q15/00 ; H01Q1/36

Abstract:
A lens design method is disclosed for designing a lens to reshape an actual far-field radiation pattern of a radiation source, such as a spiral antenna, to a preferred far-field radiation pattern. The method comprises:—determining a preferred far-field radiation pattern of the radiation source;—deriving a corresponding near-field radiation pattern from the preferred far-field radiation pattern;—determining an actual near-field pattern of the radiation source;—mapping an electric field and a magnetic field of the actual near-field radiation pattern to the derived near-field radiation pattern using a transfer relationship, the transfer relationship comprising material parameters which characterize the lens; and,—determining the material parameters.
Public/Granted literature
- US20170162944A1 LENS DESIGN METHOD AND RADIATION SOURCE SUBSTRATE Public/Granted day:2017-06-08
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