Invention Grant
- Patent Title: Process for producing liquid discharge head
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Application No.: US15044514Application Date: 2016-02-16
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Publication No.: US10201974B2Publication Date: 2019-02-12
- Inventor: Jun Yamamuro , Kazuhiro Asai , Keiji Matsumoto , Koji Sasaki , Masahisa Watanabe , Kunihito Uohashi , Seiichiro Yaginuma , Ryotaro Murakami , Kenji Fujii
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Venable LLP
- Priority: JP2015-057952 20150320
- Main IPC: B41J2/16
- IPC: B41J2/16

Abstract:
A process for producing a liquid discharge head including a substrate having a liquid supply path passing through from its first surface to second surface and an discharge port forming member having a discharge port communicating with the supply path through a flow path, the process including providing a first layer of photosensitive resin in a region covering an opening of the supply path in the first surface; forming a latent image of a pattern of the flow path in the first layer by exposure; providing a second layer of negative photosensitive resin on the first layer; curing a portion, opposing to the opening of the supply path in the first surface, of the second layer; forming a latent image of a pattern of the discharge port in the second layer by exposure; and developing latent images of patterns of the flow path and discharge port.
Public/Granted literature
- US20160271949A1 PROCESS FOR PRODUCING LIQUID DISCHARGE HEAD Public/Granted day:2016-09-22
Information query
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