Invention Grant
- Patent Title: Method for treating waste liquid from process of etching indium tin oxide
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Application No.: US15685736Application Date: 2017-08-24
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Publication No.: US10202703B2Publication Date: 2019-02-12
- Inventor: Yongxian Xie , Chuanfeng Deng , Youlu Li , Zhiyang He
- Applicant: BOE Technology Group Co., Ltd. , Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Beijing CN Anhui
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Anhui
- Agency: Westman, Champlin & Koehler, P.A.
- Priority: CN201710009118 20170105
- Main IPC: C02F1/46
- IPC: C02F1/46 ; C25F3/08 ; C02F1/461 ; C02F9/00 ; C02F1/04 ; C02F1/467 ; C02F1/52 ; C02F1/66 ; C02F103/34

Abstract:
This disclosure provides a method for treating an etching waste liquid from an etching process of indium tin oxide comprising hydrochloric acid, acetic acid, tin ions, indium ions and water, comprising the steps of: distilling the etching waste liquid to obtain a distillate comprising hydrochloric acid and acetic acid and a post-distillation liquid comprising tin ions and indium ions; generating a precipitate by reacting tin ions in the post-distillation liquid with sulfide ions to remove tin ions from the solution so as to obtain a post-precipitation solution containing indium ions; and electrolyzing the post-precipitation solution to obtain crude indium.
Public/Granted literature
- US20180187327A1 METHOD FOR TREATING WASTE LIQUID FROM PROCESS OF ETCHING INDIUM TIN OXIDE Public/Granted day:2018-07-05
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