Invention Grant
- Patent Title: Color film substrate and manufacturing method thereof
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Application No.: US15123667Application Date: 2016-07-20
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Publication No.: US10203542B2Publication Date: 2019-02-12
- Inventor: Jiangjiang Song
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee Address: CN Shenzhen, Guangdong
- Agent Andrew C. Cheng
- Priority: CN201610519603 20160701
- International Application: PCT/CN2016/090650 WO 20160720
- International Announcement: WO2018/000483 WO 20180104
- Main IPC: G02B5/20
- IPC: G02B5/20 ; G02F1/1335 ; G02F1/1339

Abstract:
The present disclosure discloses a color film substrate and a manufacturing method thereof, increase a translucent pattern with one layer has groove structure between the substrate and the color blocking pattern, and increase the contact area between the color blocking pattern and the translucent pattern through the groove structure, by means of the contact of the translucent pattern and the substrate, thereby increasing the contact area between the color blocking pattern and the substrate, it is possible to avoid the color blocking pattern peeling, to improve the quality of the product.
Public/Granted literature
- US20180210283A1 COLOR FILM SUBSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2018-07-26
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