Invention Grant
- Patent Title: Coating compositions for use with an overcoated photoresist
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Application No.: US15283248Application Date: 2016-09-30
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Publication No.: US10203602B2Publication Date: 2019-02-12
- Inventor: Eui-Hyun Ryu , Myung-Yeol Kim , EunHye Cho , Jung-June Lee , Jae Hwan Sim
- Applicant: Rohm and Haas Electronic Materials Korea Ltd.
- Applicant Address: KR Cheonan, Chungcheongnam-do
- Assignee: Rohm and Haas Electronic Materials Korea Ltd.
- Current Assignee: Rohm and Haas Electronic Materials Korea Ltd.
- Current Assignee Address: KR Cheonan, Chungcheongnam-do
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/09 ; C08G73/02 ; C08G73/06 ; C09D5/00 ; C09D175/02 ; C09D179/04 ; G03F7/16 ; H01L21/027
Abstract:
Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more resins and 2) one or more substituted isocyanurate compounds that are distinct from the 1) one or more resins.
Public/Granted literature
- US20180095367A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST Public/Granted day:2018-04-05
Information query
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