Invention Grant
- Patent Title: Separation method and manufacturing method of flexible device
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Application No.: US15486545Application Date: 2017-04-13
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Publication No.: US10205007B2Publication Date: 2019-02-12
- Inventor: Shunpei Yamazaki , Junpei Yanaka , Seiji Yasumoto , Masakatsu Ohno , Hiroki Adachi
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2016-086552 20160422; JP2016-086553 20160422
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/66 ; H01L21/02 ; H01L21/311

Abstract:
A low-cost separation method with high mass productivity is provided. A first layer with a thickness of 0.1 μm or more and 3 μm or less can be formed by using a photosensitive and thermosetting material over the formation substrate, a resin layer comprising an opening is formed by forming an opening in the first layer by using a photolithography method, a silicon layer or an oxide layer is formed so as to overlap with the opening of the resin layer, a transistor including a metal oxide is formed over the resin layer, a conductive layer formed in the same manufacturing steps as the source or drain of the transistor is formed over the silicon layer or the oxide layer, the resin layer and one of the silicon layer and the oxide layer are irradiated with the laser light, and the transistor and the conductive layer are separated from the formation substrate.
Public/Granted literature
- US20170309731A1 SEPARATION METHOD AND MANUFACTURING METHOD OF FLEXIBLE DEVICE Public/Granted day:2017-10-26
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