Invention Grant
- Patent Title: Production method for deposition mask
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Application No.: US14714175Application Date: 2015-05-15
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Publication No.: US10208373B2Publication Date: 2019-02-19
- Inventor: Michinobu Mizumura
- Applicant: V TECHNOLOGY CO., LTD.
- Applicant Address: JP Yokohama-shi
- Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee Address: JP Yokohama-shi
- Agency: Morgan, Lewis & Bockius LLP
- Priority: JP2012-250974 20121115
- Main IPC: B23K26/03
- IPC: B23K26/03 ; B23K26/066 ; C23C14/04 ; C23C16/04 ; B05B15/00

Abstract:
A production method for a deposition mask is provided. The production method includes the steps of: forming a mask member having a structure in which a thin-board magnetic metal member having a through hole and a resin film contact tightly with each other; forming a mark that has a specified depth by irradiating a part of the film through the through hole of the mask member with laser beams; and forming an opening pattern that penetrates the film by irradiating a predetermined position with laser beams, using the mark as a reference.
Public/Granted literature
- US20150259780A1 PRODUCTION METHOD FOR DEPOSITION MASK Public/Granted day:2015-09-17
Information query
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