Invention Grant
- Patent Title: Probe position inspection apparatus, semiconductor device inspection apparatus and semiconductor device inspection method
-
Application No.: US15206339Application Date: 2016-07-11
-
Publication No.: US10209273B2Publication Date: 2019-02-19
- Inventor: Norihiro Takesako , Takaya Noguchi , Akira Okada
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP2015-199058 20151007
- Main IPC: G01R1/067
- IPC: G01R1/067 ; G01R1/04 ; G01R3/00

Abstract:
A probe position inspection apparatus capable of inspecting the position of contact portions of respective probe tips easily and accurately, an apparatus for inspecting a semiconductor device, and a method of inspecting a semiconductor device are provided. The probe position inspection apparatus includes a transparent plate, a camera for taking an image of one surface of the transparent plate, and a pressure passive member covering the other surface of the transparent plate. The tip of a probe for use in evaluation of a semiconductor device is pressed against the other surface of the transparent plate, with the pressure passive member therebetween. The probe position inspection apparatus further includes an image processor for processing the image taken by the camera to detect the position of the probe in the plane of the transparent plate.
Public/Granted literature
Information query