- Patent Title: Process-metrology reproducibility bands for lithographic photomasks
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Application No.: US15838423Application Date: 2017-12-12
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Publication No.: US10210292B2Publication Date: 2019-02-19
- Inventor: Todd C. Bailey , Ioana C. Graur , Scott D. Halle , Marshal A. Miller
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Stephen R. Yoder
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F7/20
Abstract:
A photomask lithography simulation model is created for making a semiconductor chip. Poor metrology is filtered and removed from a contour-specific metrology dataset to improve performance of the photomask. Filtering is performed by the application of a weighting scheme.
Public/Granted literature
- US20180101630A1 PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS Public/Granted day:2018-04-12
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