Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
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Application No.: US15695312Application Date: 2017-09-05
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Publication No.: US10211166B2Publication Date: 2019-02-19
- Inventor: Kouji Matsuo
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Tokyo
- Assignee: Toshiba Memory Corporation
- Current Assignee: Toshiba Memory Corporation
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JP2017-060009 20170324
- Main IPC: H01L23/58
- IPC: H01L23/58 ; H01L21/768 ; H01L25/00 ; H01L25/18 ; H01L23/532 ; H01L27/11582

Abstract:
According to one embodiment, a semiconductor device includes a first semiconductor circuit layer including a first conductive layer, a second semiconductor circuit layer including a second conductive layer, and a third semiconductor circuit layer between the first semiconductor circuit layer and the second semiconductor circuit layer, the third semiconductor circuit layer including a third conductive layer in contact with the first conductive layer, a fourth conductive layer in contact with the second conductive layer, and a fifth conductive layer in contact with the third conductive layer and electrically connected to the fourth conductive layer. The fifth conductive layer has a width that is narrower than a width of the third conductive layer.
Public/Granted literature
- US20180277497A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2018-09-27
Information query
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