Invention Grant
- Patent Title: Acoustic wave filter and method for manufacturing the same
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Application No.: US15286182Application Date: 2016-10-05
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Publication No.: US10211810B2Publication Date: 2019-02-19
- Inventor: Won Kyu Jeung
- Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electo-Mechanics Co., Ltd.
- Current Assignee: Samsung Electo-Mechanics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: NSIP Law
- Priority: KR10-2016-0018316 20160217
- Main IPC: H03H9/54
- IPC: H03H9/54 ; H03H3/04 ; H03H9/205 ; H03H3/02 ; H03H9/58 ; H03H9/02

Abstract:
An acoustic wave filter includes a substrate having voids formed therein; a first resonator disposed on one or more of the voids, and a second resonator disposed on other of the voids. A first trimming layer is provided in the first resonator, and a second trimming layer is provided in the second resonator. The second trimming layer is formed of a material having an etching rate for a given etchant different from that of the first trimming layer.
Public/Granted literature
- US20170237411A1 ACOUSTIC WAVE FILTER AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2017-08-17
Information query
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