Invention Grant
- Patent Title: Interlayer distance controlled graphene, supercapacitor and method of producing the same
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Application No.: US14515010Application Date: 2014-10-15
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Publication No.: US10214422B2Publication Date: 2019-02-26
- Inventor: Hyoyoung Lee , Keun Sik Lee
- Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
- Applicant Address: KR Suwon-si
- Assignee: Research & Business Foundation Sungkyunkwan University
- Current Assignee: Research & Business Foundation Sungkyunkwan University
- Current Assignee Address: KR Suwon-si
- Agency: NSIP Law
- Priority: KR10-2013-0123456 20131016; KR10-2014-0005458 20140116
- Main IPC: H01G11/52
- IPC: H01G11/52 ; C01B31/04 ; H01G11/36 ; C01B32/184

Abstract:
A method of producing interlayer distance controlled graphene, an interlayer distance controlled graphene composition, and a supercapacitor are provided. A method of producing an interlayer distance controlled graphene involves dispersing a graphene oxide in a solution by using a surfactant, forming a reduced graphene oxide by adding a reducing agent into the solution containing the dispersed graphene oxide, and adding a pillar material that is activated at its both ends by a N2+ group into the solution containing the reduced graphene oxide to control an interlayer distance of the reduced graphene oxide.
Public/Granted literature
- US20150103469A1 INTERLAYER DISTANCE CONTROLLED GRAPHENE, SUPERCAPACITOR AND METHOD OF PRODUCING THE SAME Public/Granted day:2015-04-16
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