Invention Grant
- Patent Title: Electron beam inspection apparatus and electron beam inspection method
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Application No.: US15623416Application Date: 2017-06-15
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Publication No.: US10215718B2Publication Date: 2019-02-26
- Inventor: Atsushi Ando
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-145619 20160725
- Main IPC: G01N23/22
- IPC: G01N23/22 ; G01N23/2204 ; G01N23/2251

Abstract:
An electron beam inspection apparatus includes a stage to mount a substrate to be inspected thereon and to be continuously movable, an electron beam column, while the stage continuously moves, to scan the substrate by irradiating the substrate with multi-beams composed of a plurality of first electron beams in a plurality of beam rows, in each of which corresponding beams of the plurality of first electron beams are arranged at a same pitch in a straight line, such that the center of each of irradiation regions irradiated with the multi-beams does not overlap with the other irradiation regions in a movement direction of the stage, and a detector to detect a secondary electron emitted from the substrate due to irradiation of the multi-beams on the substrate.
Public/Granted literature
- US20180024082A1 ELECTRON BEAM INSPECTION APPARATUS AND ELECTRON BEAM INSPECTION METHOD Public/Granted day:2018-01-25
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