An infrared reflective patterned product includes an infrared reflective pattern portion which has an infrared reflective material in a region constituting at least a part of a support. The infrared reflective pattern portion has an uneven structure which includes a plurality of protruding or recessed portions. Metal particles are contained on surfaces of the protruding or recessed portions. The particles include 60 number-percent or greater of tabular metal particles in a hexagonal or circular shape, and the tabular particles which are plane-oriented so that an angle between a principal plane of the particle and a surface of the uneven structure closest to the particle is in a range of 0° to ±30° are adjusted to be 50 number-percent or greater of all tabular metal particles. In the patterned product, the ratio of the reflectance of the infrared reflective pattern portion at a wavelength with the highest reflectance in an infrared region of 780 nm to 2500 nm to the reflectance of a non-pattern portion is large in a case where the infrared reflective pattern portion is obliquely irradiated with infrared rays.