Invention Grant
- Patent Title: Plasma processing apparatus and plasma processing method with a carrier wave group generating unit
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Application No.: US15573156Application Date: 2016-05-10
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Publication No.: US10217612B2Publication Date: 2019-02-26
- Inventor: Shinji Kubota
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2015-097520 20150512
- International Application: PCT/JP2016/063926 WO 20160510
- International Announcement: WO2016/181974 WO 20161117
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/3065 ; H01L21/31
Abstract:
A plasma processing apparatus includes a processing vessel; a carrier wave group generating unit configured to generate a carrier wave group including multiple carrier waves having different frequencies belonging to a preset frequency band centered around a predetermined center frequency; and a plasma generating unit configured to generate plasma within the processing vessel by using the carrier wave group.
Public/Granted literature
- US20180090301A1 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD Public/Granted day:2018-03-29
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