- Patent Title: Semiconductor device having an internal-field-guarded active region
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Application No.: US15757501Application Date: 2016-09-09
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Publication No.: US10217898B2Publication Date: 2019-02-26
- Inventor: Gerald Pahn , Gordon Callsen , Axel Hoffmann
- Applicant: Technische Universitat Berlin
- Applicant Address: DE Berlin
- Assignee: TECHNISCHE UNIVERSITÄT BERLIN
- Current Assignee: TECHNISCHE UNIVERSITÄT BERLIN
- Current Assignee Address: DE Berlin
- Agency: Ware, Fressola, Maguire & Barber LLP
- Priority: DE102015217330 20150910
- International Application: PCT/EP2016/071366 WO 20160909
- International Announcement: WO2017/042368 WO 20170316
- Main IPC: H01L33/06
- IPC: H01L33/06 ; H01L31/0352 ; H01L33/02 ; H01L33/16 ; H01L21/02 ; H01L33/00 ; H01L33/04 ; B82Y20/00

Abstract:
A semiconductor device comprises a layer sequence formed by a plurality of polar single crystalline semiconductor material layers that each have a crystal axis pointing in a direction of crystalline polarity and a stacking direction of the layer sequence. A core layer sequence is formed by an active region made of an active layer stack or a plurality of repetitions of the active layer stack. The active layer stack has an active layer having a first material composition associated with a first band gap energy, and carrier-confinement layers embedding the active layer on at least two opposite sides thereof, having a second material composition associated with a second band gap energy larger than the first band gap energy. A pair of polarization guard layers is arranged adjacent to the active region and embedding the active region on opposite sides thereof. Both polarization guard layers have the first material composition.
Public/Granted literature
- US20180261718A1 SEMICONDUCTOR DEVICE HAVING AN INTERNAL-FIELD-GUARDED ACTIVE REGION Public/Granted day:2018-09-13
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