Invention Grant
- Patent Title: Terminal fitting and connector
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Application No.: US15770429Application Date: 2016-10-18
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Publication No.: US10218102B2Publication Date: 2019-02-26
- Inventor: Hajime Watanabe , Yoshifumi Saka
- Applicant: AUTONETWORKS TECHNOLOGIES, LTD. , SUMITOMO WIRING SYSTEMS, LTD. , SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Applicant Address: JP Yokkaichi, Mie JP Yokkaichi, Mie JP Osaka-shi, Osaka
- Assignee: AutoNetworks Technologies, Ltd.,Sumitomo Wiring Systems, Ltd.,SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee: AutoNetworks Technologies, Ltd.,Sumitomo Wiring Systems, Ltd.,SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee Address: JP Yokkaichi, Mie JP Yokkaichi, Mie JP Osaka-shi, Osaka
- Agency: Reising Ethington, P.C.
- Priority: JP2015-218753 20151106
- International Application: PCT/JP2016/080868 WO 20161018
- International Announcement: WO2017/077856 WO 20170511
- Main IPC: H01R13/03
- IPC: H01R13/03 ; C25D7/00 ; C25D5/50 ; H01R43/16 ; C25D5/12 ; H01R12/58

Abstract:
A terminal fitting that can reduce the terminal insertion force and can suppress surface oxidation of a plating film, even if the terminal fitting is exposed to a hot and humid environment, and a connector that uses the terminal fitting. The terminal fitting includes a metal base material, and the plating film. The plating film includes a Ni foundation layer, an outermost layer exposed at the outermost surface, and a Ni3Sn4 layer formed between the Ni foundation layer and the outermost layer. The outermost layer includes a Sn parent phase, and intermetallic compound that is dispersed in the Sn parent phase, and is made of (Ni0.4Pd0.6)Sn4. The intermetallic compound protrudes from the lower side of the outermost layer to the Ni3Sn4 layer side, and is partially buried in the Ni3Sn4 layer. A connector includes the terminal fitting, and a housing that holds the terminal fitting.
Public/Granted literature
- US20180316110A1 TERMINAL FITTING AND CONNECTOR Public/Granted day:2018-11-01
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