Invention Grant
- Patent Title: Gas optimization in a gas discharge light source
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Application No.: US15457600Application Date: 2017-03-13
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Publication No.: US10218147B2Publication Date: 2019-02-26
- Inventor: Tanuj Aggarwal
- Applicant: Cymer, LLC
- Applicant Address: US CA San Diego
- Assignee: Cymer, LLC
- Current Assignee: Cymer, LLC
- Current Assignee Address: US CA San Diego
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: H01S3/08
- IPC: H01S3/08 ; H01S3/13 ; H01S3/036 ; H01S3/23 ; H01S3/134 ; H01S3/225 ; H01S3/104 ; H01S3/038 ; H01S3/097 ; H01S3/0971

Abstract:
In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.
Public/Granted literature
- US20170237224A1 GAS OPTIMIZATION IN A GAS DISCHARGE LIGHT SOURCE Public/Granted day:2017-08-17
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