Invention Grant
- Patent Title: Method of manufacturing functional fabric
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Application No.: US15211546Application Date: 2016-07-15
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Publication No.: US10219564B2Publication Date: 2019-03-05
- Inventor: Kim Ching Yeung
- Applicant: AP TRENNEL LIMITED
- Applicant Address: CN Hong Kong
- Assignee: AP TRENNEL LIMITED
- Current Assignee: AP TRENNEL LIMITED
- Current Assignee Address: CN Hong Kong
- Agency: Cantor Colburn LLP
- Priority: CN201510776490 20151113
- Main IPC: B29C41/20
- IPC: B29C41/20 ; B29C41/22 ; B29C70/68 ; A41D31/02 ; B33Y10/00 ; B33Y70/00 ; B33Y80/00 ; B28B1/00 ; B29C43/20 ; A41D7/00 ; A41C3/00 ; A41D13/00 ; B29C64/106 ; B29C64/118 ; B29C64/112 ; B29K667/00 ; B29K105/00 ; B29L31/00

Abstract:
The present invention relates to a functional fabric, comprising: a substrate layer, said substrate layer including a cloth and a functional layer on said substrate layer, said functional layer including a silica gel masterbatch and anion additives, and having a three-dimensional configuration, wherein said functional layer has a thickness such that said functional fabric is capable of releasing a concentration of 1,000-6,000 anions per cubic centimeter.
Public/Granted literature
- US20170135427A1 FUNCTIONAL FABRIC AND MANUFACTURING METHOD THEREOF Public/Granted day:2017-05-18
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