- Patent Title: Plasma generating method including generating first plasma without supplying first gas in liquid and generating second plasma in first gas, and plasma generating apparatus
-
Application No.: US15464877Application Date: 2017-03-21
-
Publication No.: US10220107B2Publication Date: 2019-03-05
- Inventor: Minoru Egawa , Yoshihiro Sakaguchi
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2016-072360 20160331
- Main IPC: A61L2/14
- IPC: A61L2/14 ; H01J37/32 ; C02F1/46 ; C02F1/467 ; C02F101/30

Abstract:
A plasma generating method, used in a plasma generating apparatus which includes a container, a first electrode, and a second electrode, includes: supplying a liquid in the container so that the second electrode is in contact with the liquid; in a first period, generating first plasma in a bubble generated in the liquid by applying a first voltage between the first electrode and the second electrode; supplying a first gas in the liquid in a second period after the first period; and generating second plasma in the first gas by applying a second voltage between the first electrode and the second electrode. In generating the first plasma, the first gas is not supplied in the liquid. The bubble contains a second gas.
Public/Granted literature
Information query
IPC分类: