- Patent Title: Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method by detecting a light amount of measuring light
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Application No.: US12654590Application Date: 2009-12-23
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Publication No.: US10222293B2Publication Date: 2019-03-05
- Inventor: Hiroshi Ooki , Ayako Nakamura
- Applicant: Hiroshi Ooki , Ayako Nakamura
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2007-167857 20070626
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G01M11/02 ; G03F1/44 ; G03F7/20

Abstract:
There is provided an optical characteristic measuring method for measuring an optical characteristic of an optical system which forms, on a second plane, an image of an object arranged on a first plane, the optical characteristic measuring method including: arranging, on the first plane, a first area through which a measuring light passes or by which the measuring light is reflected; arranging a second area, through which the measuring light passes or by which the measuring light is reflected, on the second plane at a position corresponding to the first area; and detecting, via one of the first area and the second area, a light amount of the measuring light via the optical system and the other of the first area and the second area; wherein at least one of the first area and the second area has a shape such that a light amount, of the measuring light which passes or which is reflected via the optical system, is changed depending on the optical characteristic.
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