Invention Grant
- Patent Title: Flow channel device, complex permittivity measuring apparatus, and dielectric cytometry system
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Application No.: US13142701Application Date: 2010-01-07
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Publication No.: US10222314B2Publication Date: 2019-03-05
- Inventor: Yoichi Katsumoto , Shinji Omori
- Applicant: Yoichi Katsumoto , Shinji Omori
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JP2009-003648 20090109; JP2009-289465 20091221
- International Application: PCT/JP2010/050366 WO 20100107
- International Announcement: WO2010/079844 WO 20100715
- Main IPC: G01N15/12
- IPC: G01N15/12 ; G01N15/10 ; C40B60/14

Abstract:
A flow channel device, a complex permittivity measuring apparatus, and a dielectric cytometry system are provided which can improve the measurement accuracy. A constriction portion having a constricted space is disposed between an inflow port and an outflow port of a flow channel. Electrodes are arranged between the inflow port and the constriction portion and between the outflow port and the constriction portion. The conductance of the constriction portion at a low-limit frequency is less than the combined conductance of an inflow channel portion and an outflow channel portion. The capacitance of the constriction portion at a high-limit frequency is less than the combined capacitance of the inflow channel portion and the outflow channel portion.
Public/Granted literature
- US20110269221A1 FLOW CHANNEL DEVICE, COMPLEX PERMITTIVITY MEASURING APPARATUS, AND DIELECTRIC CYTOMETRY SYSTEM Public/Granted day:2011-11-03
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