Invention Grant
- Patent Title: Laminate substrate measurement method, laminate substrate and measurement apparatus
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Application No.: US15718198Application Date: 2017-09-28
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Publication No.: US10222321B2Publication Date: 2019-03-05
- Inventor: Taiki Yamamoto , Taketsugu Yamamoto , Kenji Kasahara
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2015-067788 20150329; JP2015-067789 20150329
- Main IPC: G01N21/21
- IPC: G01N21/21 ; G01B11/06 ; G01N21/33

Abstract:
A measurement method for a laminate substrate is provided. The laminate substrate has: a base substrate; an absorption layer; and a measurement-target layer in this order. The measurement-target layer has a single measurement-target monolayer or a plurality of measurement-target monolayers. The method includes: emitting incident light including light with a wavelength shorter than a threshold wavelength from a side on which the measurement-target layer is positioned, and measuring reflected light and acquiring mutually independent 2n (n is a layer count of the measurement-target monolayers included in the measurement-target layer and is an integer equal to one or larger) or more reflected light-related values for wavelengths equal to the threshold wavelength or shorter; and calculating values related to the measurement-target monolayers for each measurement-target monolayer included in the measurement-target layer using the 2n or more reflected light-related values.
Public/Granted literature
- US20180017484A1 LAMINATE SUBSTRATE MEASUREMENT METHOD, LAMINATE SUBSTRATE AND MEASUREMENT APPARATUS Public/Granted day:2018-01-18
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