- Patent Title: High sensitivity force gauge with parallel dipole line trap system
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Application No.: US15647923Application Date: 2017-07-12
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Publication No.: US10222350B2Publication Date: 2019-03-05
- Inventor: Oki Gunawan
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Michael J. Chang, LLC
- Agent Vazken Alexanian
- Main IPC: G01L5/00
- IPC: G01L5/00 ; G01N27/72

Abstract:
A high sensitivity force gauge using a magnetic PDL trap system is provided. In one aspect, a force gauge includes: a PDL trap having a pair of dipole line magnets and a diamagnetic rod levitating above the dipole line magnets; an actuator with an extension bar adjacent to the PDL trap; a first object of interest attached to the diamagnetic rod; and a second object of interest attached to the extension bar, wherein the actuator is configured to move the second object of interest toward or away from the PDL trap via the extension bar. A method for force measurement using the present force gauge is also provided.
Public/Granted literature
- US20190017965A1 High Sensitivity Force Gauge with Parallel Dipole Line Trap System Public/Granted day:2019-01-17
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