Invention Grant
- Patent Title: Polymer pen lithography
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Application No.: US15159148Application Date: 2016-05-19
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Publication No.: US10222694B2Publication Date: 2019-03-05
- Inventor: Chad A. Mirkin , Fengwei Huo , Zijian Zheng , Gengfeng Zheng
- Applicant: NORTHWESTERN UNIVERSITY
- Applicant Address: US IL Evanston
- Assignee: NORTHWESTERN UNIVERSITY
- Current Assignee: NORTHWESTERN UNIVERSITY
- Current Assignee Address: US IL Evanston
- Agency: Marshall, Gerstein & Borun LLP
- Main IPC: G03F7/00
- IPC: G03F7/00 ; B82Y10/00 ; B82Y40/00 ; B82Y30/00

Abstract:
The disclosure relates to methods of printing indicia on a substrate using a tip array comprised of elastomeric, compressible polymers. The tip array can be prepared using conventional photolithographic methods and can be tailored to have any desired number and/or arrangement of tips. Numerous copies (e.g., greater than 15,000, or greater than 11 million) of a pattern can be made in a parallel fashion in as little as 40 minutes.
Public/Granted literature
- US20160357101A1 POLYMER PEN LITHOGRAPHY Public/Granted day:2016-12-08
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