Invention Grant
- Patent Title: Resist composition and patterning process
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Application No.: US15375353Application Date: 2016-12-12
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Publication No.: US10222696B2Publication Date: 2019-03-05
- Inventor: Jun Hatakeyama , Masaki Ohashi
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2015-256315 20151228; JP2016-135001 20160707
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/40 ; C07C303/32 ; G03F7/039 ; G03F7/038 ; G03F7/16 ; G03F7/20 ; G03F7/32
Abstract:
A resist composition comprising a base polymer and a biguanide salt compound offers a high dissolution contrast, minimal LWR, and dimensional stability on PPD.
Public/Granted literature
- US20170184962A1 RESIST COMPOSITION AND PATTERNING PROCESS Public/Granted day:2017-06-29
Information query
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