Invention Grant
- Patent Title: Radiation source
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Application No.: US15550855Application Date: 2016-01-21
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Publication No.: US10222702B2Publication Date: 2019-03-05
- Inventor: Arno Jan Bleeker , Ramon Mark Hofstra , Erik Petrus Buurman , Johannes Hubertus Josephina Moors , Alexander Matthijs Struycken , Harm-Jan Voorma , Sumant Sukdew Ramanujan Oemrawsingh , Markus Franciscus Antonius Eurlings , Peter Frans Maria Muys
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & fox P.L.L.C.
- Priority: EP15155790 20150219
- International Application: PCT/EP2016/051242 WO 20160121
- International Announcement: WO2016/131601 WO 20160825
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20 ; H01S3/00 ; G02B27/14 ; H05G2/00 ; H01S3/23

Abstract:
A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.
Public/Granted literature
- US20180031979A1 Radiation Source Public/Granted day:2018-02-01
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