Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US14743775Application Date: 2015-06-18
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Publication No.: US10222706B2Publication Date: 2019-03-05
- Inventor: Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP02257822 20021112; EP03252955 20030513
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20 ; G03F9/00
Abstract:
In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
Public/Granted literature
- US20150362844A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2015-12-17
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