Invention Grant
- Patent Title: Magnetoresistance effect element
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Application No.: US15554410Application Date: 2016-03-28
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Publication No.: US10224067B2Publication Date: 2019-03-05
- Inventor: Tomoyuki Sasaki
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2015-071410 20150331
- International Application: PCT/JP2016/059884 WO 20160328
- International Announcement: WO2016/158849 WO 20161006
- Main IPC: G11B5/39
- IPC: G11B5/39 ; H01L43/08 ; H01L43/10 ; H01L27/105 ; G11C11/16 ; H01F10/193 ; H01L27/22 ; H01F1/40

Abstract:
A magnetoresistance effect element has a first ferromagnetic metal layer, a second ferromagnetic metal layer, and a tunnel barrier layer that is sandwiched between the first and second ferromagnetic metal layers, the tunnel barrier layer is expressed by a chemical formula of AB2Ox, and has a spinel structure in which cations are arranged in a disordered manner, A represents a divalent cation that is either Mg or Zn, and B represents a trivalent cation that includes a plurality of elements selected from the group consisting of Al, Ga, and In.
Public/Granted literature
- US20180068681A1 MAGNETORESISTANCE EFFECT ELEMENT Public/Granted day:2018-03-08
Information query
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