Invention Grant
- Patent Title: Plasma source device and methods
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Application No.: US15067060Application Date: 2016-03-10
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Publication No.: US10224186B2Publication Date: 2019-03-05
- Inventor: Scott Polak , Daniel Carter , Karen Peterson , Randy Grilly , Mike Thornton , Daniel J. Hoffman
- Applicant: Advanced Energy Industries, Inc.
- Applicant Address: SG Singapore
- Assignee: AES Global Holdings, PTE. LTD
- Current Assignee: AES Global Holdings, PTE. LTD
- Current Assignee Address: SG Singapore
- Agency: Neugeboren O'Dowd PC
- Main IPC: H05H1/42
- IPC: H05H1/42 ; C23C16/50 ; H01J37/32 ; C23C16/455 ; C23C14/00

Abstract:
This disclosure describes a remote plasma source, a gas input manifold, and related methods of making and using. In some examples, a remote plasma source is provided with a plasma chamber, a gas input manifold, and an output region. The remote plasma source also has means for introducing a gas into the plasma chamber, the means for introducing configured to impart a radial velocity and a longitudinal velocity on the gas, relative to a longitudinal axis through the remote plasma source.
Public/Granted literature
- US20160268104A1 Plasma Source Device and Methods Public/Granted day:2016-09-15
Information query
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