Invention Grant
- Patent Title: Superjunction semiconductor device having a superstructure
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Application No.: US15887660Application Date: 2018-02-02
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Publication No.: US10224394B2Publication Date: 2019-03-05
- Inventor: Hans Weber , Christian Fachmann , Daniel Tutuc , Andreas Voerckel
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE102015120510 20151126
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L23/544 ; H01L21/66 ; H01L29/66 ; H01L29/423 ; H01L21/027 ; H01L21/308 ; H01L21/321 ; H01L29/78 ; H01L29/861 ; H01L29/739

Abstract:
According to an embodiment of a semiconductor substrate, the semiconductor substrate includes a superjunction structure in a device region of a semiconductor layer and an alignment mark in a kerf region of the semiconductor layer. The superjunction structure includes first regions and second regions of opposite conductivity types, the first and the second regions alternating along at least one horizontal direction. The alignment mark includes a vertical step formed by an alignment structure projecting or recessed from a main surface of the semiconductor layer. The alignment structure is of a material of the first regions of the superjunction structure.
Public/Granted literature
- US20180158901A1 Superjunction Semiconductor Device Having a Superstructure Public/Granted day:2018-06-07
Information query
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