Invention Grant
- Patent Title: Substrate processing apparatus arranged in process chamber and operating method thereof
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Application No.: US15573480Application Date: 2016-05-10
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Publication No.: US10229849B2Publication Date: 2019-03-12
- Inventor: Ki Bum Kim , Seung Youb Sa , Ram Woo , Myung Jin Lee , Seung Dae Choi , Jong Sung Choi , Ho Boem Her
- Applicant: JUSUNG ENGINEERING CO., LTD.
- Applicant Address: KR
- Assignee: JUSUNG ENGINEERING CO., LTD.
- Current Assignee: JUSUNG ENGINEERING CO., LTD.
- Current Assignee Address: KR
- Agency: Renaissance IP Law Group LLP
- Priority: KR10-2015-0065094 20150511; KR10-2015-0097515 20150709
- International Application: PCT/KR2016/004842 WO 20160510
- International Announcement: WO2016/182299 WO 20161117
- Main IPC: B25B11/00
- IPC: B25B11/00 ; H01L21/683 ; H01L21/687

Abstract:
Disclosed is a substrate processing apparatus including a disc provided so as to be rotatable on its axis, at least one susceptor disposed on the disc such that a substrate is seated on an upper surface thereof, the susceptor being configured to rotate on its axis and to revolve around a center of the disc as the disc rotates on its axis, a metal ring coupled to a lower portion of the susceptor, the metal ring being arranged such that a center thereof coincides with a center of the susceptor, and a magnet provided below the disc so as to be radially arranged on a basis of the center of the disc, at least a portion of the magnet being opposite the metal ring in a vertical direction.
Public/Granted literature
- US20180144968A1 SUBSTRATE PROCESSING APPARATUS ARRANGED IN PROCESS CHAMBER AND OPERATING METHOD THEREOF Public/Granted day:2018-05-24
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