Invention Grant
- Patent Title: Semiconductor resistor structure and method for making
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Application No.: US15419002Application Date: 2017-01-30
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Publication No.: US10229966B2Publication Date: 2019-03-12
- Inventor: Mattias Erik Dahlström , Li Jen Choi
- Applicant: Texas Instruments Incorporated
- Applicant Address: US TX Dallas
- Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee Address: US TX Dallas
- Agent Rose Alyssa Keagy; Charles A. Brill; Frank D. Cimino
- Main IPC: H01L49/02
- IPC: H01L49/02 ; H01L21/027 ; H01L21/3205

Abstract:
Disclosed examples include a resistor comprising a semiconductor structure having a length dimension with first and second ends spaced from one another and an intermediate region between the first and second ends, first and second metal-semiconductor compound structures on the semiconductor structure proximate the first and second ends of the semiconductor structure, the first and second metal-semiconductor compound structures being spaced apart from each other along the length dimension of the semiconductor structure, and at least one intermediate metal-semiconductor compound structure on a portion of the intermediate region of the semiconductor structure between the first and second ends, the intermediate metal-semiconductor compound structure being spaced apart from the first and second metal-semiconductor compound structures on the semiconductor structure.
Public/Granted literature
- US20180190753A1 SEMICONDUCTOR RESISTOR STRUCTURE AND METHOD FOR MAKING Public/Granted day:2018-07-05
Information query
IPC分类: