Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15607697Application Date: 2017-05-30
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Publication No.: US10229972B2Publication Date: 2019-03-12
- Inventor: Tetsutaro Imagawa
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kanagawa
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kanagawa
- Priority: JP2015-122037 20150617
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L29/10 ; H01L29/78 ; H01L29/739 ; H01L29/32 ; H01L21/265 ; H01L29/66

Abstract:
A semiconductor layer of a first conductivity type has a plurality of impurity concentration peaks that are differently positioned in a first direction extending from a first surface to a second surface, and an integrated concentration obtained by integrating an impurity concentration value in the first direction from (i) the first surface that is a junction interface between the semiconductor layer of the first conductivity type and the semiconductor layer of the second conductivity type to (ii) a boundary between a first impurity concentration peak of the plurality of impurity concentration peaks that is the closest to the first surface and a second impurity concentration peak of the plurality of impurity concentration peaks that is the second closest to the first surface is equal to or lower than a critical integrated concentration.
Public/Granted literature
- US20170278929A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-09-28
Information query
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