Invention Grant
- Patent Title: Skin cleansing composition
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Application No.: US15322245Application Date: 2015-06-29
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Publication No.: US10231920B2Publication Date: 2019-03-19
- Inventor: Kouhei Yamada , Hitoshi Tajima
- Applicant: KAO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: KAO CORPORATION
- Current Assignee: KAO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-135422 20140630; JP2014-135423 20140630
- International Application: PCT/JP2015/068675 WO 20150629
- International Announcement: WO2016/002713 WO 20160107
- Main IPC: A61K8/37
- IPC: A61K8/37 ; A61K8/39 ; A61K8/60 ; A61K8/86 ; A61K8/92 ; C11D1/66 ; C11D1/72 ; C11D3/20 ; C11D3/22 ; A61Q1/14 ; C11D1/825 ; A61Q19/10 ; C11D3/37 ; C11D1/74

Abstract:
A skin cleansing composition comprising the following components (A), (B), (C), (D), (E), (F), and (G): (A) from 0.5 to 20% by mass of an oil agent having a viscosity at 30° C. of more than 30 mPa·s, (B) from 0.5 to 20% by mass of an oil agent having a viscosity at 30° C. of 30 mPa·s or less, (C) from 1 to 15% by mass of a nonionic surfactant having an HLB of 10 or more and having a residue obtained by removing a hydrogen atom from at least one hydroxyl group in sugar, reducing sugar, or polyglycerin as a hydrophilic group, (D) from 1 to 15% by mass of a nonionic surfactant having an HLB of 8 or less, (E) from 10 to 60% by mass of a polyhydric alcohol, (F) from 10 to 50% by mass of water, and (G) from 4 to 45% by mass of a nonionic surfactant having an HLB of 10 or more and having a polyoxyethylene chain as a hydrophilic group, wherein the mass ratio of the component (A) to the components (B), (A)/(B), is from 0.05 to 30, and the ratio of the total mass of the components (A) and (B) to the total mass of the components (C), (D), and (G), ((A)+(B))/((C)+(D)+(G)), is from 0.1 to 1.5.
Public/Granted literature
- US20170151159A1 SKIN CLEANSING COMPOSITION Public/Granted day:2017-06-01
Information query